专利名称：Alignment device and lithographic apparatus
comprising such a device
发明人：Peter Dirksen,Antonius M. Nuijs申请号：US09324421申请日：19990601公开号：US06417922B1公开日：20020709
专利附图：
摘要：An alignment device, for use in a lithographic apparatus, for aligning a firstobject, provided with a first alignment mark relative to a second object, provided with asecond alignment mark, employs as a radiation source a laser which emits an alignment
beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.
申请人：ASML NETHERLANDS B.V.
代理机构：Pillsbury Winthrop LLP
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